Eur. Phys. J. Plus (2021) 136: 517
https://doi.org/10.1140/epjp/s13360-021-01513-w

Regular Article

Preparation and characterization of vanadium-doped nickel oxide nanostructure deposited by dip-coating technique

¹ Department of Physics and Chemistry, Faculty of Science, Emam Ali University, Tehran, Iran
² Department of Physics, Faculty of Science, University of Guilan, P.O. Box 413351914, Namjoo Avenue, Rasht, Iran

^a farhad.chharganeh.f4@gmail.com

Received: 16 March 2021
Accepted: 29 April 2021
Published online: 11 May 2021

Abstract

We investigated the effect of vanadium doping on chemical and physical properties of nickel oxide thin films grown on the glass substrates by the dip-coating technique. FTIR studies approved the formation of NiO bonds. XRD patterns indicated that all samples have a cubic structure, while have occurred some changes in FWHM and position of peaks with doping of V. The surface topography of V-doped NiO film at 10% shows that the grains were grown in the form of a channel-island pattern. The surface roughness decreases slightly with the addition of vanadium at first and then rises with increasing concentration of vanadium. The superhydrophilic nature of V-doped NiO films (contact angle, θ < 15°) indicates that those are suitable for self-cleaning application. Optical transmittance of the NiO:V thin film increases with the adding V dopant. However, with increasing V concentration, the optical transmittance decreases. Vanadium doping of NiO thin films led to decrease in the band gap of energy. Also, V doping leads to a slight red shift of the PL spectrum of the films. The highest amount of interfacial capacity (24.2 mF.cm⁻²) and charge density (15.7 mC.cm⁻²) were obtained for NiO:V (10%) sample.