Preparation and characterization of vanadium-doped nickel oxide nanostructure deposited by dip-coating technique
Department of Physics and Chemistry, Faculty of Science, Emam Ali University, Tehran, Iran
2 Department of Physics, Faculty of Science, University of Guilan, P.O. Box 413351914, Namjoo Avenue, Rasht, Iran
Accepted: 29 April 2021
Published online: 11 May 2021
We investigated the effect of vanadium doping on chemical and physical properties of nickel oxide thin films grown on the glass substrates by the dip-coating technique. FTIR studies approved the formation of NiO bonds. XRD patterns indicated that all samples have a cubic structure, while have occurred some changes in FWHM and position of peaks with doping of V. The surface topography of V-doped NiO film at 10% shows that the grains were grown in the form of a channel-island pattern. The surface roughness decreases slightly with the addition of vanadium at first and then rises with increasing concentration of vanadium. The superhydrophilic nature of V-doped NiO films (contact angle, θ < 15°) indicates that those are suitable for self-cleaning application. Optical transmittance of the NiO:V thin film increases with the adding V dopant. However, with increasing V concentration, the optical transmittance decreases. Vanadium doping of NiO thin films led to decrease in the band gap of energy. Also, V doping leads to a slight red shift of the PL spectrum of the films. The highest amount of interfacial capacity (24.2 mF.cm−2) and charge density (15.7 mC.cm−2) were obtained for NiO:V (10%) sample.
© The Author(s), under exclusive licence to Società Italiana di Fisica and Springer-Verlag GmbH Germany, part of Springer Nature 2021