https://doi.org/10.1140/epjp/s13360-024-05439-x
Regular Article
Electron collision cross sections in tetrafluoropropene HFO1234ze(E) for gas mixtures in resistive plate chambers
1
INFN, Milan, Italy
2
Universitá degli Studi di Torino and INFN, Turin, Italy
Received:
9
March
2024
Accepted:
9
July
2024
Published online:
25
July
2024
In recent years, there has been growing interest in tetrafluoropropene HFO1234ze(E) (CH
F
) for Resistive Plate Chambers (RPCs). This novel gas is considered a promising alternative to the standard mixtures currently used in RPCs, thanks to its low global warming potential. The knowledge of electron collision cross sections in C
H
F
enables reliable predictions of electron transport coefficients and reaction rates in C
H
F
-based gas mixtures. This allows for optimizing the C
H
F
-based gas mixtures to achieve the desired performance in RPCs. From measurements of electron transport coefficients and reaction rates, a complete set of scattering cross sections for electrons in C
H
F
has been derived. Validation of the electron collision cross sections is achieved through systematic comparisons of electron swarm parameters with experimental data in both pure C
H
F
and C
H
F
/CO
gas mixtures. Given the influence of electron attachment in C
H
F
by the gas density, this work also includes precise calculations of the critical electric field strength in such mixtures. This set of cross sections has been further utilized to compute the effective ionization Townsend coefficient in gas mixtures containing C
H
F
, potentially applicable for RPCs.
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© The Author(s), under exclusive licence to Società Italiana di Fisica and Springer-Verlag GmbH Germany, part of Springer Nature 2024. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.