https://doi.org/10.1140/epjp/s13360-022-03332-z
Regular Article
Investigation of analog resistive switching in ZrO2 nanostructured film
1
Department of Physics, Indian Institute of Technology Delhi, 110016, Hauz Khas, New Delhi, India
2
Nanoscale Research Facility (NRF), Indian Institute of Technology Delhi, 110016, Hauz Khas, New Delhi, India
c
nkhare@physics.iitd.ernet.in
Received:
8
July
2022
Accepted:
27
September
2022
Published online:
29
October
2022
In this article, we report the synthesis of Zirconium Oxide (ZrO2) nanostructure by hydrothermal method and fabrication of resistive switching device [FTO/ZrO2/Ag] using spray coated ZrO2 nanostructured film. The XRD spectrum of the film indicates the formation of a single-phase ZrO2 nanostructure. I–V measurement of the fabricated device shows gradual set and reset at 0.8 and − 0.7 V, respectively, which confirms the presence of analog switching in the device. The conduction mechanism has been explored with a I–V fitting model in high resistive state and low resistive state, respectively. In high resistive state, the device stays in the ohmic region at lower bias however at higher bias due to filling of available traps the electrical transport is dominated by space charge limited conduction (SCLC). On the other hand, in low resistive state, charge carriers are detrapped and the electrical conduction process is again governed by SCLC conduction.
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© The Author(s), under exclusive licence to Società Italiana di Fisica and Springer-Verlag GmbH Germany, part of Springer Nature 2022. Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.