Eur. Phys. J. Plus (2022) 137: 686
https://doi.org/10.1140/epjp/s13360-022-02908-z

Regular Article

Preparation and parametric analysis of film/substrate band-gap systems based on elastic instability

¹ Key Laboratory of Testing Technology for Manufacturing Process, Ministry of Education, Southwest University of Science and Technology, 621010, Mianyang, China
² Wuhan Second Ship Design and Research Institute, 430064, Wuhan, China
³ Department of Astronautical Science and Mechanics, Harbin Institute of Technology, 150001, Harbin, China

^g liuhaidong@swust.edu.cn
^h feijia@hit.edu.cn
^j gubin@swust.edu.cn

Received: 21 March 2022
Accepted: 3 June 2022
Published online: 12 June 2022

Abstract

Film/substrate systems with periodic surface morphology generated by elastic instability can have important applications in elastic wave control, as proved by previous finite element analysis. However, experimental verification remains a challenge because of the limited magnitude and adjustment of patterns wavelength, the interface debonding and the structure warpage. A novel experimental method in which film and substrate are selected homologues, and two-phase moisture curing process is adopted to control the physical state of the substrate, the surface pattern and the residual mismatch stress was firstly proposed to prepare the bilayer structures without the detachment and the warpage. Vibration test showed that propagation of the elastic waves could be suppressed in the fabricated bilayer system. Through modelling the formation of surface patterns and the propagation of elastic waves, finite element simulation and dimensional analysis were carried out to examine the band-gap performance of various bilayer structures. Numerical results show that the wavelength of surface patterns which depends on four processing parameters, i.e., the instability load, the film thickness and the elastic moduli of the film and the substrate after the first curing, is crucial to the band-gap properties of film/substrate systems. An analytical expression is given to approximately estimate the surface patterns wavelength and a design guide is suggested to manufacture the film/substrate system considering the film limiting conditions in practice.