https://doi.org/10.1140/epjp/s13360-025-06928-3
Review
Plasma sheath physics: a circuital description, amelioration, and application
1
Department of Physics, Tezpur University, 784028, Napaam, Tezpur, Assam, India
2
Department of Physics, Sikkim Manipal Institute of Technology, Sikkim Manipal University (SMU), Majitar, India
Received:
3
June
2025
Accepted:
4
October
2025
Published online:
17
October
2025
A synoptic review of the electrical circuital model-based analysis of laboratory plasma sheaths, alongside their stability features in a realistic broader horizon, is systematically presented herein. It explains the basic physics responsible behind the inductive (
), capacitive (
), and resistive (
) properties simultaneously, exhibited by plasma sheaths. The analyzed model sheath behaviors are judiciously described in the light of the state-of-the-art sheath scenarios illustratively. The sheath-based circuital components are minutely contrasted with the commercially available circuital counterparts. The applications of the novel circuital sheath model in widespread fields of research having both fundamental and applied importance are discussed. The main merits of modeling plasma sheaths through the circuital formalism over the existing non-circuital theoretic ones are outlined together with future scope.
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© The Author(s), under exclusive licence to Società Italiana di Fisica and Springer-Verlag GmbH Germany, part of Springer Nature 2025
Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
